Study of the Growth of Magnesium Oxide Thin Films Using X-Ray Diffraction Technique: Mini Review-Juniper Publishers
Juniper Publishers Abstract X-ray diffraction method has been used by many researchers in order to study the structure of films. In this work, amorphous structure or polycrystalline magnesium oxide thin films could be identified using this technique. Furthermore, the grain sizes could be measured using X-ray diffraction data as well. Keywords: Magnesium oxide, Thin films, Semiconductor, Deposition, Grain size Introduction Oxide materials [1-12] and metal chalcogenide thin films [13-21] are widely employed in the producing of solar cells, sensor devices, laser devices, optoelectronics devices, integrated circuits, and microelectronics. There are many groups of scientists from different countries involved to study these materials [22-29]. In this work, magnesium oxide (MgO) films were prepared using various deposition techniques. Magnesium oxide was chosen due to it has a high melting temperature, stable a...